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Engineered for advanced electronics manufacturers, precision ceramic fabricators, and specialty material engineers, our high-purity spherical silica powder is a top-tier functional filler produced via state-of-the-art flame fusion technology. With a minimum SiO2 purity of 99.6%, sphericity ≥97%, and fully customizable median particle size (D50 0.5μm to 50μm), this advanced powder is designed to enhance the performance, reliability, and processing efficiency of high-end composite materials. Tailored for demanding industrial environments, our spherical silica powder for electronic packaging and semiconductor applications delivers consistent batch-to-batch quality, meeting the strictest requirements of the global advanced materials industry.
Indicator | Standard Value | Testing Standard |
SiO2 Purity | ≥99.6% | GB/T 20020-2013 |
Sphericity | ≥97% | ISO 9276-1:1998 |
Median Particle Size (D50) | 0.5μm-50μm (customizable) | ISO 13320:2009 |
Density | 2.2-2.4 g/cm³ | GB/T 5162-2021 |
Specific Surface Area | 1-30 m²/g (adjustable by particle size) | BET Method |
Moisture Content | ≤0.1% | GB/T 6284-2016 |
Loss on Ignition | ≤0.5% | GB/T 6284-2016 |
Melting Point | ≥1600°C | / |
Soluble Metal Ions (Na+, K+) | ≤5ppm | / |
Our semiconductor grade spherical silica powder boasts a minimum SiO2 purity of 99.6%, with ultra-low soluble metal ion content (Na+, K+ ≤5ppm) to eliminate signal interference and material degradation in sensitive electronic applications. This ultra-high purity meets the strict material requirements of semiconductor and microelectronic manufacturing, ensuring long-term reliability of end products.
With a sphericity rate of ≥97%, our powder delivers exceptional flowability and packing density, significantly reducing the viscosity of polymer and resin systems during processing. The perfect spherical shape minimizes internal stress in composite materials, reduces wear on processing equipment, and enables higher filler loading rates without compromising processing efficiency.
Every batch is strictly graded via laser particle size analysis, with fully customizable D50 particle sizes ranging from 0.5μm to 50μm, and adjustable specific surface area to match your unique application requirements. This precision control ensures consistent performance across prototype development, small-batch production, and large-scale industrial manufacturing.
Our high-purity spherical silica features outstanding thermal stability with a melting point ≥1600°C, low hygroscopicity, and excellent resistance to acid and alkali corrosion. It maintains stable physical and chemical properties in harsh high-temperature, high-humidity, and chemically aggressive environments, making it ideal for demanding industrial applications.
As the industry-leading spherical silica powder for electronic packaging, it is the core filler for epoxy molding compounds (EMC), chip encapsulants, and underfill materials, reducing the thermal expansion coefficient of composites and improving thermal conductivity and dimensional stability for semiconductor devices.
Widely used as a functional filler for high-frequency PCB substrates in 5G communication equipment, it optimizes dielectric properties, reduces signal loss, and improves the thermal stability of substrate materials, ensuring stable high-speed signal transmission in 5G and next-generation communication systems.
It serves as a critical sintering aid and functional filler for Low Temperature Co-fired Ceramic (LTCC) and High Temperature Co-fired Ceramic (HTCC) products, enhancing densification, improving mechanical strength, and optimizing the dielectric properties of precision ceramic components for electronics and automotive applications.
Used in high-end anti-corrosion, wear-resistant, and weather-resistant industrial coatings, it improves coating hardness, leveling performance, and scratch resistance, extending the service life of coated surfaces in harsh industrial and marine environments.
Our standard high-purity spherical silica powder has a minimum sphericity rate of 97%, with higher sphericity grades available upon request for ultra-high-precision electronic and semiconductor applications.
Yes, we offer fully customizable D50 particle sizes ranging from 0.5μm to 50μm, with adjustable specific surface area and particle size grading to match your unique formulation, processing, and end-use requirements.
Our semiconductor-grade material features a minimum SiO2 purity of 99.6%, with soluble metal ion content (Na+, K+) controlled to ≤5ppm, and we can provide tighter impurity control specifications for ultra-high-sensitivity microelectronic applications.
Our spherical silica powder for 5G substrates optimizes the dielectric constant and dielectric loss of PCB materials, reduces thermal expansion coefficient to improve dimensional stability, and enhances thermal conductivity to dissipate heat generated during high-frequency operation, ensuring stable signal transmission.
Engineered for advanced electronics manufacturers, precision ceramic fabricators, and specialty material engineers, our high-purity spherical silica powder is a top-tier functional filler produced via state-of-the-art flame fusion technology. With a minimum SiO2 purity of 99.6%, sphericity ≥97%, and fully customizable median particle size (D50 0.5μm to 50μm), this advanced powder is designed to enhance the performance, reliability, and processing efficiency of high-end composite materials. Tailored for demanding industrial environments, our spherical silica powder for electronic packaging and semiconductor applications delivers consistent batch-to-batch quality, meeting the strictest requirements of the global advanced materials industry.
Indicator | Standard Value | Testing Standard |
SiO2 Purity | ≥99.6% | GB/T 20020-2013 |
Sphericity | ≥97% | ISO 9276-1:1998 |
Median Particle Size (D50) | 0.5μm-50μm (customizable) | ISO 13320:2009 |
Density | 2.2-2.4 g/cm³ | GB/T 5162-2021 |
Specific Surface Area | 1-30 m²/g (adjustable by particle size) | BET Method |
Moisture Content | ≤0.1% | GB/T 6284-2016 |
Loss on Ignition | ≤0.5% | GB/T 6284-2016 |
Melting Point | ≥1600°C | / |
Soluble Metal Ions (Na+, K+) | ≤5ppm | / |
Our semiconductor grade spherical silica powder boasts a minimum SiO2 purity of 99.6%, with ultra-low soluble metal ion content (Na+, K+ ≤5ppm) to eliminate signal interference and material degradation in sensitive electronic applications. This ultra-high purity meets the strict material requirements of semiconductor and microelectronic manufacturing, ensuring long-term reliability of end products.
With a sphericity rate of ≥97%, our powder delivers exceptional flowability and packing density, significantly reducing the viscosity of polymer and resin systems during processing. The perfect spherical shape minimizes internal stress in composite materials, reduces wear on processing equipment, and enables higher filler loading rates without compromising processing efficiency.
Every batch is strictly graded via laser particle size analysis, with fully customizable D50 particle sizes ranging from 0.5μm to 50μm, and adjustable specific surface area to match your unique application requirements. This precision control ensures consistent performance across prototype development, small-batch production, and large-scale industrial manufacturing.
Our high-purity spherical silica features outstanding thermal stability with a melting point ≥1600°C, low hygroscopicity, and excellent resistance to acid and alkali corrosion. It maintains stable physical and chemical properties in harsh high-temperature, high-humidity, and chemically aggressive environments, making it ideal for demanding industrial applications.
As the industry-leading spherical silica powder for electronic packaging, it is the core filler for epoxy molding compounds (EMC), chip encapsulants, and underfill materials, reducing the thermal expansion coefficient of composites and improving thermal conductivity and dimensional stability for semiconductor devices.
Widely used as a functional filler for high-frequency PCB substrates in 5G communication equipment, it optimizes dielectric properties, reduces signal loss, and improves the thermal stability of substrate materials, ensuring stable high-speed signal transmission in 5G and next-generation communication systems.
It serves as a critical sintering aid and functional filler for Low Temperature Co-fired Ceramic (LTCC) and High Temperature Co-fired Ceramic (HTCC) products, enhancing densification, improving mechanical strength, and optimizing the dielectric properties of precision ceramic components for electronics and automotive applications.
Used in high-end anti-corrosion, wear-resistant, and weather-resistant industrial coatings, it improves coating hardness, leveling performance, and scratch resistance, extending the service life of coated surfaces in harsh industrial and marine environments.
Our standard high-purity spherical silica powder has a minimum sphericity rate of 97%, with higher sphericity grades available upon request for ultra-high-precision electronic and semiconductor applications.
Yes, we offer fully customizable D50 particle sizes ranging from 0.5μm to 50μm, with adjustable specific surface area and particle size grading to match your unique formulation, processing, and end-use requirements.
Our semiconductor-grade material features a minimum SiO2 purity of 99.6%, with soluble metal ion content (Na+, K+) controlled to ≤5ppm, and we can provide tighter impurity control specifications for ultra-high-sensitivity microelectronic applications.
Our spherical silica powder for 5G substrates optimizes the dielectric constant and dielectric loss of PCB materials, reduces thermal expansion coefficient to improve dimensional stability, and enhances thermal conductivity to dissipate heat generated during high-frequency operation, ensuring stable signal transmission.